Wolfgang Bacsa, University of Toulouse
Lynn Foster, Z-Field Technologies LLC
Lisa Friedersdorf, National Nanotechnology Coordination Office
Srinivas Iyer, Los Alamos National Laboratory
Chris Menzel, Fujifilm Dimatix, Inc.
Brent Segal, Lockheed Martin
William (Cy) Wilson, NASA Langley Research Center
Xing Zhou, Nanyang Technological University, Singapore
Wolfgang Bacsa, University of Toulouse, France
Tim Barckholtz, ExxonMobil, US
John Barnes, The Barnes Global Advisors, US
Sehoon Chang, Aramco Services Company, US
Ida Chen, The Dow Chemical Company, US
Jeannine Coburn, Worcester Polytechnic Institute, US
Liam Collins, Oak Ridge National Laboratory, US
Alison Fritz, National Energy Technology Laboratory, US
Slade Gardner, Big Metal Additive, US
Peter Grutter, McGill University, Canada
Imre Gyuk, U.S. Department of Energy, US
Jan-Willem Handgraaf, Siemens Digital Industries Software, Netherlands
Greg Haugstad, University of Minnesota, US
Santa Jansone-Popova, Oak Ridge National Laboratory, US
Jim Johnston, Victoria University of Wellington, New Zealand
Mandakini Kanungo, Corning, Inc., US
Jason Killgore, National Institute of Standards and Technology, US
R. Joseph Kline, National Institute of Standards and Technology, US
John Kopasz, Argonne National Laboratory, US
Piotr Kulczakowicz, Quantum Startup Foundry, US
Matt Kweon, ExxonMobil, US
Yuming Lai, The Dow Chemical Company, US
Qilin Li, Rice University, US
Arnie Lumsdaine, Oak Ridge National Laboratory, US
Joey Mead, University of Massachusetts, Lowell, US
Chris Menzel, Fujifilm Dimatix, Inc., US
Prakash Nallathamby, Notre Dame University, US
Sang Nam, George Mason University, US
Christina Newcomb, Stanford University, US
Alex Norman, Princeton University, US
Kwang Oh, University at Buffalo (SUNY), US
Andriy Palasyuk, Ames National Laboratory, US
Martin Poitzsch, Aramco Services Company, US
Elena Polyakova, Graphene Laboratories, Inc., US
Carlos Quiroz, Sandia National Laboratories, US
Yuanqiao Rao, The Dow Chemical Company, US
Daniel Schmidt, IBM, US
Amarda Shehu, George Mason University, US
Maksim Shivokhin, ExxonMobil, US
Christopher Sims, National Institute of Standards and Technology, US
Kenan Song, Arizona State University, US
Erik Spoerke, Sandia National Laboratories, US
Anirudha Sumant, Argonne National Laboratory, US
Halil Tekinalpm, Oak Ridge National Laboratory, US
Loucas Tsakalakos, Coherent Inc, US
Shruti Venkatram, 3M, US
Thomas Webster, Interstellar Therapeutics, US
William "Cy" Wilson, NASA Langley Research Center, US
Yiliang Wu, CollTech North America, US
Dalia Yablon, SurfaceChar LLC, US
Helen Zha, Rensselaer Polytechnic Institute, US
Lin Zhao, The Dow Chemical Company, US
Junyong Zhu, U.S Department of Agriculture, US
Wolfgang Bacsa, University of Toulouse, France
Tim Barckholtz, ExxonMobil, US
John Barnes, The Barnes Global Advisors, US
Osman Basaran, Purdue University, US
Alex Belianinov, Sandia National Laboratories, US
Jean Berthier, University of Washington Seattle, US
Samuel Brunner, Swiss Federal Laboratories for Materials Science and Technology, Switzerland
Sehoon Chang, Aramco Services Company, US
Ida Chen, The Dow Chemical Company, US
Nitin Chopra, AdMatIX LLC, US
Matt Clancy, UltraTech, US
Jeannine Coburn, Worcester Polytechnic Institute, US
Arzu Colak, Clarkson University, US
Liam Collins, Oak Ridge National Laboratory, US
Thomas Cubaud, Stony Brook University, US
Alison Fritz, National Energy Technology Laboratory, US
Slade Gardner, Big Metal Additive, Inc, US
Joamin Gonzalez-Gutierrez, Luxembourg Institute of Science and Technology (LIST), Luxembourg
Shubhodeep Goswami, GE Global Research, US
Micah Green, Texas A and M, US
Peter Grutter, McGill University, Canada
Imre Gyuk, U.S. Department of Energy, US
Johannes Hachman, University at Buffalo, SUNY, US
Jan-Willem Handgraaf, Siemens Digital Industries Software, The Netherlands
Greg Haugstad, University of Minnesota, US
Andreas Hieke, Stanford University, US
Jingsong Huang, Oak Ridge National Laboratory, US
Santa Jansone-Popova, Oak Ridge National Laboratory, US
Jim Johnston, Victoria University of Wellington, US
Steven Jons, DuPont Water Solutions, US
Mandakini Kanungo, Corning, US
Jason Killgore, National Institute of Standards and Technology, US
R. Joseph Kline, National Institute of Standards and Technology, US
Bryan Koene, Luna Innovations, US
John Kopasz, Argonne National Laboratory, US
Piotr Kulczakowicz, University of Maryland, US
Matt Kweon, ExxonMobil, US
Yuming Lai, The Dow Chemical Company, US
Nikola Lambic, ExxonMobil, US
Kock-Yee Law, Research and Innovative Solutions, US
Patrick Lee, University of Toronto, US
Yuhan Lee, Harvard Medical School, US
Sang-Young Lee, Yonsei University, US
Qilin Li, Rice University, US
Arnie Lumsdaine, Oak Ridge National Laboratory, US
Joey Mead, University of Massachusetts, Lowell, US
Chris Menzel, Fujifilm Dimatix, Inc., US
Moein Moghimi, Newcastle University, US
Sven Mumme, U.S. Department of Energy, US
Prakash Nallathamby, University of Notre Dame, US
Sang Nam, George Mason University, US
Christina Newcomb, Stanford University, US
Patricia Nieva, University of Waterloo, US
Alex Norman, Princeton University, US
Kwang Oh, University at Buffalo (SUNY), US
Andriy Palasyuk, Ames Laboratory, US
Srikanth Pilla, Clemson University, US
Martin Poitzsch, Aramco Research Center-Boston, US
Elena Polyakova, Graphene 3D Labs, US
Zhiyuan (Zach) Qian, Modern Meadow, US
Carlos Quiroz, Sandia National Laboratories, US
Yuan Qiao Rao, The Dow Chemical Company, US
Robert Rudd, Lawrence Livermore National Laboratory, US
Jonathan Saathoff, ExxonMobil, US
Paul Sander, UltraTech, US
Daniel Schmidt, IBM, US
Neeraj Sharma, 3M Corporate Research Laboratory, US
Amarda Shehu, George Mason University, US
Maksim Shivokhin, ExxonMobil, US
Ginger Sigmon, Energy Frontier Research Center, US
Christopher Sims, National Institute of Standards and Technology, US
Emilie J Siochi, NASA Langley Research Center, US
Kenan Song, Arizona State University, US
Erik Spoerke, Sandia National Laboratories, US
Anirudha Sumant, Argonne National Laboratory, US
Halil Tekinalpm, Oak Ridge National Laboratory, US
Loucas Tsakalakos, Coherent Inc., US
Shruti Venkatram, 3M, US
Erika Vreeland, Sandia National Laboratories, US
YuHuang Wang, University of Maryland, US
Thomas Webster, Miraki Innovations, US
William (Cy) Wilson, NASA Langley Research Center, US
Yiliang Wu, CollTech North America, US
Dalia Yablon, SurfaceChar LLC, US
Helen Zha, Rensselaer Polytechnic Institute, US
Lin Zhao, The Dow Chemical Company, US
Junyong Zhu, U.S Deparment of Agriculture, US