Phase-change photolithography: Rapid diffraction limited patterning of organic electronic materials

Z.I. Bedolla-Valdez, Z. Su, G. Gonal, T.L. Murrey, C.C. Cendra-Guinassi, A. Salleo, C. Grigoropoulos, A.J. Moulé
University of California, Davis,
United States

Keywords: organic electronics, patterning, coating, printing


The ability to pattern materials scalably and at low-cost using photolithography has been the key manufacturing advance that enabled the IT revolution and has driven Moore’s Law. Photolithographic methods are routinely used to fabricate heterostructures of inorganic electronic materials with lateral features of 10 µm because inadequate options to pattern and layer organic materials are available.1-2 The promise of organic electronics stems from the potential to combine the versatility of chemical synthesis to make designer materials with added functionality like flexibility, biocompatibility, and light weight and also from the reduced cost provided by low-temperature solution processing. A significant obstacle for the industrial development of organic electronic devices is the lack of a patterning technology having the disruptive power that photolithography exerted in traditional microelectronics. Here we present a complete set of patterning and sequential solution processing steps that enable rapid, non-destructive, optical patterning of both materials and/or dopants that can be universally applied to organic electronic materials to achieve sub-µm lateral features