Scalable Nanopatterning using Roll-based Jet and FlashTM Imprint Lithography

P. Hofemann
Molecular Imprints Inc., US

Keywords: R2R nanopatterning, nanoimprint lithography, Jet and Flash Imprint Lithography (J-FIL)


The ability to pattern materials at the nanoscale over large areas can enable a variety of applications including flexible/rigid displays and electronics, photonic devices, biomedical sensors, nanoparticle drug delivery, and photovoltaic devices. In this work, we propose a scalable roll-based imprint system designed to address the markets discussed above.