Tunable-Linewidth Nanoimprint Working Stamps Fabricated by Double Oblique Metal Deposition

C.H. Lin, C.L. Wu, C.K. Sung
National Tsing Hua University, TW

Keywords: nanoimprint, oblique deposition, working stamp


This paper proposes a low cost but rapid methodology for fabricating working stamps with tunable line-width or pitch structures. Conventionally, the master stamp for nanoimprint lithograph (NIL) is made of silicon by e-beam lithography, which requires a lot of time and cost. In addition, various line-widths or pitches of the patterns on the replicating stamp may be needed for different applications. Moreover, this method could fabricate the similar quality of working stamps even the original patterns of master stamp were eroded after a number of imprints.