Effects of Solvents on Dissolution of Photoresist in Parylene Microchannels

H. Ceylan Koydemir, H. Kulah, C. Ozgen, I. Tosun
Middle East Technical University, TR

Keywords: microchannels, dissolution, photoresist


This paper presents a detailed study for the effects of different types of solvents on dissolution of photoresist inside the parylene micro-channels, for the first time. Experimental results indicate that photoresist dissolution in dipolar aprotic solvents is much faster than the other types of solvents. This finding can be used to select alternative chemicals for stripping encapsulated photoresist.