NSTI BioNano 2011

André  Rouzaud

André Rouzaud

Deputy VP of Microsystems and Heterogeneous Integration on Silicon



André Rouzaud has an Engineering/Master degree and a PhD degree in materials processing from Institut National Polytechnique de Grenoble. In 1984, he joined CEA-Grenoble where he successively worked in the fields of theoretical and experimental crystal growth of Si and SiGe alloys, and then sputtering technologies of oxides, carbides and nitrides. After five years of management of a laboratory dedicated to surface treatments (PVD, CVD technologies) he joined LETI where he is now deputy VP of Microsystems and Heterogeneous Integration on Silicon. He is author or co-author of more than 30 publications, mainly in the field of experimental and theoretical crystal growth, process modelling, sputtering technologies and mechanical properties of thin layers. He is also directly involved in 11 patents in the same areas.

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