The photonic crystal laser based on the silica opal structure with dye doped photoresist

C-T. Kuo
National Sun Yat-sen University,
Taiwan

Keywords: photonic crystal, photonic band gap

Summary:

In this study, a photonic crystal (PC) laser has been proposed based on the silica opal structure filled with dye doped photoresist. The mono-dispersed silica particles are fabricated by the Stöber process [1, 2], and the diameter of the silica particles can be controlled by the concentration of tetraethyl orthosilicate (TEOS) in the reaction. The wavelength of photonic band gap (PBG) in the PC (or opal) structure can be predicted by the Bragg’s diffraction theory [3]. Thus, the lasing wavelength of PC laser can be controlled by changing the size of silica particle in the opal structure. The PC laser can be fabricated by doping dye (R6G) with negative photoresist (SU-8) as the gain medium filled into the voids of the opal structure as the cavity. After the irradiation of Nd:YAG pulsed laser, the fluorescence of R6G can be generated and accumulated on the PBG’s edges of the opal structures resulting in the lasing of the PC laser. The lasing wavelength of the PC laser can be further adjusted by changing the PBG of the opal structures. Reference [1] W. Stöber, A. Fink, and E. Bohn, J. Colloid Interface Sci. 26, 62 (1968). [2] L. D. Tuyen, C. Y. Wu, T. K. Anh, L. Q. Minh, H. -C. Kan and C. -C. Hsu , J. Exp. Nanosci. 7, 198 (2012). [3] G. I. N. Waterhouse, M. R. Waterland, Polyhedron 26, 356 (2007)