Fabrication of gratings at the CNST NanoFab

R. Kasica, V. Luciani
National Institute of Standards and Technology,
United States

Keywords: waveguides, gratings, fabrication

Summary:

The fabrication of micro-and nano-scale gratings is a critical step in the development of many photonic devices such as optical filters, waveguides, and DFB/DBR lasers. During the development cycle, the optimization of grating parameters can often be a costly and time consuming process, especially when the fabrication involves nanoscale gratings. The CNST NanoFab is utilizing our extensive micro- and nano-fabrication capabilities to offer researchers from industry, academia and government a useful and cost effective method for the development of grating enabled devices. By adjusting grating parameters such as duty cycle and pitch in a baseline CAD file design supplied by the researcher, an array of gratings sizes can be defined and subsequently exposed using our lithography systems. This parameter matrix can then be used to implement a powerful design of experiments (DOE) across a substrate to optimize the product or process performance of a device on a single wafer or material substrate. The experimental design can be chosen to identify critical parameters using a screening DOE, a response surface analysis to study parameter interactions or a straight forward parameter optimization DOE during the device development phase. The CNST Nanofab has the ability to work with a variety of substrate material types and sizes with printing capabilities that range from sub-50 nanometers to millimeters in size.