TechConnect Innovation Program

Continuous lithographic technique and exposure apparatus

Kyungpook National University Industry-Academic Cooperation Foundation, Daegu, Korea

TECHNOLOGY SUMMARY

We produce a continuous lithographic techniques and the apparatus to produce micro/nano patterns in continuous manner. A basic fabrication process shares with typical photolithography, but continuous process was achieved by using cylindrical mask and exposure units. This technique can be used in semiconductor fabrication, display related field and so on.

Primary Application Area: Instrumentation & Manufacturing

Technology Development Status: Prototype

Technology Readiness Level: TRL 6

FIGURES OF MERIT

Value Proposition: Wafer based fabrication(fab) system has been established well, however, photolithography(PL) has not been extended to continuous fab process. Our tech is based on PL, but continuous process can be achieved by having a rolltype exposure apparatus, a flexible photomask with metal patterning. We serve our knowhow during the development of fab process setup.

SHOWCASE SUMMARY

Organization Type: Academic/Gov Lab

Showcase Booth #: 529

Website: http://iac.knu.ac.kr/

GOVT/EXTERNAL FUNDING SOURCES

Government Funding/Support to Date:

Primary Sources of Funding: University

Looking for: Both Funding and Development Partners