Continuous lithographic technique and exposure apparatus
Kyungpook National University Industry-Academic Cooperation Foundation, Daegu, Korea
We produce a continuous lithographic techniques and the apparatus to produce micro/nano patterns in continuous manner. A basic fabrication process shares with typical photolithography, but continuous process was achieved by using cylindrical mask and exposure units. This technique can be used in semiconductor fabrication, display related field and so on.
Primary Application Area: Instrumentation & Manufacturing
Technology Development Status: Prototype
Technology Readiness Level: TRL 6
FIGURES OF MERIT
Value Proposition: Wafer based fabrication(fab) system has been established well, however, photolithography(PL) has not been extended to continuous fab process. Our tech is based on PL, but continuous process can be achieved by having a rolltype exposure apparatus, a flexible photomask with metal patterning. We serve our knowhow during the development of fab process setup.
Organization Type: Academic/Gov Lab
Showcase Booth #: 529
GOVT/EXTERNAL FUNDING SOURCES
Government Funding/Support to Date:
Primary Sources of Funding: University
Looking for: Both Funding and Development Partners