Practical and Effective Methods for Graphene Surface Cleaning
Korea Research Institute of Chemical Technology, , Korea
The surface residue, inevitably occurring in the graphene layer fabrication process, is effectively removed, employing a simple electrostatic method. This method obviates the use of high temperature or the use of special apparatus such as AFM, thus resulting in a practical and effective graphene surface cleaning method.
Primary Application Area: Materials & Chemical
Technology Development Status: Prototype
Technology Readiness Level: TRL 4
FIGURES OF MERIT
Value Proposition: IP portfolio of this technology consists of 1 domestic patent application and 1 PCT application, filed in 2013. The claims of these applications cover various aspects of graphene surface cleaning techniques and the devices containing thus prepared graphene layer. Therefore, this IP portfolio can become a standard IPs for graphene fabrication process.
Organization Type: Academic/Gov Lab
Showcase Booth #: 812
GOVT/EXTERNAL FUNDING SOURCES
Government Funding/Support to Date: Korean government financial support program through Ministry of Knowledge Economy funding programs
Primary Sources of Funding: Federal Grant
Looking for: Development / License Partners