TechConnect Innovation Program

Practical and Effective Methods for Graphene Surface Cleaning

Korea Research Institute of Chemical Technology, , Korea

TECHNOLOGY SUMMARY

The surface residue, inevitably occurring in the graphene layer fabrication process, is effectively removed, employing a simple electrostatic method. This method obviates the use of high temperature or the use of special apparatus such as AFM, thus resulting in a practical and effective graphene surface cleaning method.

Primary Application Area: Materials & Chemical

Technology Development Status: Prototype

Technology Readiness Level: TRL 4

FIGURES OF MERIT

Value Proposition: IP portfolio of this technology consists of 1 domestic patent application and 1 PCT application, filed in 2013. The claims of these applications cover various aspects of graphene surface cleaning techniques and the devices containing thus prepared graphene layer. Therefore, this IP portfolio can become a standard IPs for graphene fabrication process.

SHOWCASE SUMMARY

Organization Type: Academic/Gov Lab

Global Innovation Awardee

Showcase Booth #: 812

Website: english.krict.re.kr/eng/

GOVT/EXTERNAL FUNDING SOURCES

Government Funding/Support to Date: Korean government financial support program through Ministry of Knowledge Economy funding programs

Primary Sources of Funding: Federal Grant

Looking for: Development / License Partners