Metal Oxide Nanopatterning by Infiltration Synthesis in Polymer Templates

C-Y Nam
Brookhaven National Laboratory, US

Keywords: nanopatterning, metal oxide, atomic layer deposition, block copolymer


In this talk, I will discuss a lately emerging nanopatterning approach, termed infiltration synthesis, which allows direct transformation of diblock copolymer templates into metal oxide nanopaterns. The scheme utilizes infiltration and block-selective binding of vapor-phase organometallic precursors (e.g., trimethylaluminum for AlOx) in the self-assembled diblock copolymer thin films using an atomic layer deposition system. I will elaborate our recent efforts of AlOx, TiOx, and ZnO nanopatterning on self-assembled polystyrene-block-poly(methyl methacrylate) (PS-b-PMMA) diblock copolymer thin films, wherein selective chemical interaction between organometallic precursors and block copolymer templates is controlled via photo-oxidation. I will also introduce a variation of the technique that enables infiltration synthesis of metal oxide nanostructures on arbitrarily patterned homopolymer photoresist and its implication in developing metal oxide-polymer nanocomposites with potentially tunable electrical, optical, and mechanical properties.