Novel Fabrication Technique for ZnO-PMMA Hybrid Submicron Structures

M. Gervasio
Virginia Tech, US

Keywords: nanoparticles, soft lithography, hybrid film,


This project introduces a novel fabrication method for low cost, high throughput patterning of a ZnO-poly(methyl methacrylate) (PMMA) hybrid with feature sizes as low as 250 nm. At high concentrations (50 vol%) of ZnO nanoparticles, the PMMA acts as a sacrificial forming aid which can be burned out cleanly without leaving residue behind if desired. The flexibility of the entangled PMMA chains allows the ZnO to be patterned using an elastomeric stamp. This is a novel formation technique and has the unique advantage of enabling pattern replication at feature sizes as low as 250 nm on curved surfaces. The suspensions necessary for this process are very difficult to stabilize and therefore this patterning technique has never been previously studied for this system. Applications for patterned ZnO include charge storage centers or n-type semiconductors.