Low-Cost High-Volume Scale Up of CVD Films and Nanomaterials for Industrial Applications

K. Strobl, M. Monville, R. Singhal, S. Wright, L. Rosenbaum
CVD Equipment Corporation, US

Keywords: graphene, carbon nanotubes, silicon nanowires, chemical vapor deposition, nanomaterials, thin films

Summary:

Graphene, carbon nanotubes, silicon nanowires and many other nanomaterials and thin films can be produced on flexible, often metallic, substrates using chemical vapour deposition (CVD) based processing. CVD tools can be implemented in many different ways to produce a wide range of material compositions and geometries. We will present the test results of nanomaterials manufactured using a novel CVD reactor design family that allow for high quality, uniform production at a much higher production rate than with a traditional R&D CVD reactor design. Process transfer from R&D to production quantities is quick and straightforward. In particular, we demonstrate the route to low-cost high-volume production of CVD graphene, CNTs, and SiNWs of controllable length and diameter. We demonstrate that this novel CVD reactor design family, operated in a batch processing mode, can outperform roll to roll CVD systems throughput, hence cost per coated area, while still retaining the material properties and uniformity. We also demonstrate that our design allows for the production of large rolls of nanomaterial-coated flexible substrates that can be used in subsequent roll to roll processing for various applications such as battery electrodes, flexible transparent conductors, CNT-enabled composite materials, etc.