Patterning and reduction of graphene oxide using femtosecond-laser irradiation

C.C. Evans, S. Shukla, S. Saxena, S. Kang, E. Mazur
Harvard University, US

Keywords: graphene, graphene oxide, laser processing

Summary:

We demonstrate direct writing of reduced graphene oxide using femtosecond-laser irradiation at 800 nm. We perform a systematic study of the reduction process of graphene oxide to graphene by varying both the laser fluence and the repetition rate. Our observations show that the reduction has both thermal and non-thermal components, which suggests that we can achieve a high degree of flexibility and control using kHz pulse trains.