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A Novel Method for Measuring the Sizes and Concentrations of 5-500 nm Particles in Colloidal Suspensions

H.G. Van Schooneveld, M.R. Litchy, D.G. Grant
CT Associates, Inc, US

Keywords: Colloidal suspensions, liquid filter retention, CPM slurry

Abstract:

A new measurement technique has been developed that allows for measurement of particles as small as 5 nanometers in colloidal suspensions. The technique has demonstrated the ability to provide unique and useful particle size distribution (PSD) data for chemical/mechanical planarization (CMP) slurries used heavily in the micro-electronics industry. The ability to measure filter retention of particles in the 10-20 namometer size range has also been demonstrated.
 
 
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