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Patterning Technology for Nanomanufacturing

H.I. Smith, M. Walsh, F. Zhang, G. Hourihan, J. Ferrera, M. Jaspan
LumArray, US

Keywords: lithography, patterning, manufacturing

Abstract:

We describe a new approach to patterning that circumvents the limitations of techniques that were developed for the semiconductor industry. The new approach, zone-plate-array lithograhy (ZPAL)will enable an expansion of applications of nanoscale science and engineering
 
 
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