TechConnectWorld 2011 Conference and Expo TechConnect World 2011 Nanotech 2011 Clean Technology 2011 Microtech 2011 Bio Nanotech 2011 TechConnect Summit and Expo 2011

ALD for sustainable future – building a cleaner world from sub-nanometer level

M. Toivola, T. Pilvi
Picosun Oy, FI

Keywords: atomic layer deposition, nanocoatings, photovoltaics, fuel cells, recyclable packaging


Atomic Layer Deposition (ALD) offers a superior way to coat highly conformal, uniform, pinhole and defect free thin films on even the most challenging nanoscale architectures. The technique is already widely in use in e.g. micro/optoelectronics, optics and sensor industry and is rapidly gaining foothold also in clean and renewable technology applications such as water purification, solar power, fuel cell/hydrogen/battery technology and innovative packaging materials. Picosun is a Finnish, globally operating ALD system manufacturer with world-wide sales and service organization. The company’s core business mission is to develop and manufacture ALD equipment which, with their uniquely scalable and flexible design, answer the needs of both the R&D field and those of high profile industries, thus bridging the gap between research and production. Picosun participates actively in several European Union (EU) funded research projects aiming for tomorrow’s cleaner and greener world. Novel ALD solutions are developed for example for Si nanorod solar cells, fuel cell materials, green communication technology, catalyst industry and advanced corrosion protection.
Sessions Monday Tuesday Wednesday Thursday Authors Keywords Affiliations Search

TechConnect World 2011 Nanotech 2011 Clean Technology 2011 Microtech 2011 BioNanotech 2011 TechConnect Summit 2011
2011 Events | Program | Speaker | Short Courses Sponsor Exhibit/Showcase Press Venue Register
Subscribe | Contact | Site Map
© Copyright 2010 TechConnect World. All Rights Reserved.