Three-Dimensional Etching of Silicon for the Fabrication of Low-Dimensional and Suspended Devices

S.S. Walavalkar, A.P. Homyk, A. Scherer
California Institute of Technology, US

Keywords: nanofab, 3D etching

Summary:

At the nanoscale silicon begins to display brand new behavior allowing us to treat nanostructured silicon as a new material. We will present a combination of novel top-down and bottom-up approaches to controllably and consistently fabricate CMOS compatible silicon devices with features as small as 2 nm. The talk will focus on the latest advancements in etching and oxidation that allow us shape silicon in three dimensions with sub-10 nm precision....