Nanotech 2011

A Novel Method for Measuring the Sizes and Concentrations of 5-500 nm Particles in Colloidal Suspensions

H.G. Van Schooneveld, M.R. Litchy, D.G. Grant
CT Associates, Inc, US

Keywords: Colloidal suspensions, liquid filter retention, CPM slurry


A new measurement technique has been developed that allows for measurement of particles as small as 5 nanometers in colloidal suspensions. The technique has demonstrated the ability to provide unique and useful particle size distribution (PSD) data for chemical/mechanical planarization (CMP) slurries used heavily in the micro-electronics industry. The ability to measure filter retention of particles in the 10-20 namometer size range has also been demonstrated.

TechConnect World 2011 Nanotech 2011 Clean Technology 2011 Microtech 2011 BioNanotech 2011 TechConnect Summit 2011
Program | Tracks | Exhibition | Press | Venue | Register |
Symposia | Short Courses | News | Subscribe | Contact | Site Map
© Copyright 2010 TechConnect World. All Rights Reserved.