Nanotech 2011

Polarisation stabilisation of telecom lasers by minimally-invasive direct-write focused electron beam induced deposition

I. Utke, M.G. Jenke, C. Roeling, P.H. Thiesen, V. Iakovlev, A. Sirbu, A. Mereuta, A. Caliman, E. Kapon
EMPA, Swiss Federal Laboratories for Materials Science and Technology, CH

Keywords: focused electron beam induced deposition, FEBID, VCSEL, polarization


The possibility to deposit or remove very small amounts of material for tuning purposes on a fully processed micro/nanodevice at the right place, at will, and without damage to surrounding sensitive areas can be very cost effective even if the speed of the deposition (or etching) is very low compared to standard photolithography. Here, we describe an emerging direct-write nanoscale patterning concept, based on gas-assisted focused electron beam induced deposition (FEBID), which enables local deposition of conductive material for refining the performance of a vertical-cavity surface-emitting laser (VCSEL) in a single post-process step.

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