Nanotech 2010

Coating of TiO2 Thin Films on Particles by a Rotating PCVD Process and Its Application to Pollutant Removal

H-C Pham, D-J Kim, K-S Kim
Kangwon National University, KR

Keywords: particle coating, PCVD process, rotating cylindrical plasma reactor, TiO2 thin film

Abstract:

Plasma chemical vapor deposition (PCVD) process was used to coat TiO2 thin films on particles experimentally. For the uniform particle coating, the particles should be stayed in the gas phase for some time because their total surface area is available for deposition. In this study, PCVD reactor was rotated with controlled rotation speed by DC motor to coat the TiO2 thin films on polypropylene (PP) beads. The PP beads coated with TiO2 thin films by the rotating PCVD reactor were used for phenol removal in aqueous solution to analyze their photocatalytic activities. The TiO2 thin films grow more quickly on the PP beads with increasing the rotation speed of the reactor. The photodegradation rate of phenol by TiO2 thin films on the PP beads increases as the initial phenol concentration increases or as the number of PP beads coated with TiO2 thin films increases in aqueous solution. The rotating cylindrical PCVD process can be a good method to coat the high-quality TiO2 thin films on the particles. It is proposed that the particles coated with TiO2 thin films can be applied to the removal of water pollutants with high efficiency.
 
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