Nanotech 2010

Influence of resist composition on demolding force in UV nanoimprint lithography

A. Amirsadeghi, J. Lee, S. Park
Louisiana State University, US

Keywords: nano imprint lithography, UV, demolding force, Young’s modulus


We investigated the influence of the Young’s Modulus (E) of UV resist on the measured demolding force in UV-NIL by varying compositions of UV-curable polymers. We found that decreasing crosslinking content of the polymers decreases the Young’s modulus and polymerization shrinkage and in turn the demolding force.
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