Nanotech 2010

End-Grafted Rodlike polymers: A Polymeric Self-Assembled Monolayer

M. Han, J.-W. Park
Gwangju Institute of Science and Technology, KR

Keywords: rod-coil diblock copolymer, self-assembled monolayer, micro-patterning

Abstract:

Poly(n-hexylisocyanate)-b-poly[3-(trimethoxysilyl)propyl mathacrylate] (PHIC-b-PTMSPMA) was synthesized via the atom transfer radical polymerization (ATRP). The new rod-coil block copolymer can form polymeric self-assembled monolayer (PSAM) through covalent bonding of the alkoxysilyl containing PTMSPMA coil block to the silica substrate. The PSAM was simply produced by the immersion coating method and its morphology was uniform and homogenous. It showed an anisotropic morphology resulting from local ordering of grafted rods on annealing with solvent vapor. We demonstrate the applicability of the PSAMs in the P3HT-based field-effect transistors. We also show that the PSAM is micro-patternable using UV-induced photochemical cleavage of the methacrylate moieties of anchoring blocks. Mixed SAMs were obtained by combining the PSAM with small molecule SAM and their properties were investigated.Acknowledgments: This work was supported by the Korea Science and Engineering Foundation (KOSEF) grant [R01-2008-000-12246-0] funded by the Korean goverment (MEST) and the Program for Integrated Molecular System at GIST, Korea
 
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