Microtech 2011

Electron Beam Lithography: The Nanolithography for Nanotechnology

J. Krostoff and I. Stolberg
Vistec Electron Beam Lithography Group, US

Keywords: Electron Beam Lithography

Abstract:

Electron beam lithography (EBL) has long been accepted as a valuable technology from research through manufacturing for a diverse set of technologies. EBL now provides the ideal lithography solution for nanotechnology research, development, and, in some cases, manufacturing. With proven high resolution, patterning accuracy, pattern integrity, flexibility, ease of use, and relatively low cost, EBL is paramount for nanotechnology patterning and applications. EBL’s elements, system options, technology advances, nanotechnology applications and challenges will be addressed. Vistec Lithography’s Gaussian and Shaped Beam approaches as nanolithography solutions for current and future nanotechnology will be presented.
 

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